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Scaling of Dzyaloshinskii Moriya interaction at heavy metal and ferromagnetic metal interfaces

机译:Dzyaloshinskii moriya在重金属和金属上的相互作用   铁磁金属界面

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摘要

The Dzyaloshinskii Moriya Interaction (DMI) at the heavy metal (HM) andferromagnetic metal (FM) interface has been recognized as a key ingredient inspintronic applications. Here we investigate the chemical trend of DMI on the5d band filling (5d^3~5d^10) of the HM element in HM/CoFeB/MgO multilayer thinfilms. DMI is quantitatively evaluated by measuring asymmetric spin wavedispersion using Brillouin light scattering. Sign reversal and 20 timesmodification of the DMI coefficient D have been measured as the 5d HM elementis varied. The chemical trend can be qualitatively understood by consideringthe 5d and 3d bands alignment at the HM/FM interface and the subsequent orbitalhybridization around the Fermi level. Furthermore, a positive correlation isobserved between DMI and spin mixing conductance at the HM/FM interfaces. Ourresults provide new insights into the interfacial DMI for designing futurespintronic devices.
机译:重金属(HM)和铁磁性金属(FM)界面处的Dzyaloshinskii Moriya相互作用(DMI)已被认为是自旋电子学应用中的关键成分。在此我们研究了DMI在HM / CoFeB / MgO多层薄膜中HM元素的5d带填充(5d ^ 3〜5d ^ 10)上的化学趋势。通过使用布里渊光散射测量不对称自旋波色散来定量评估DMI。随着5d HM元素的变化,已测量到DMI系数D的符号反转和20倍修正。通过考虑HM / FM界面处的5d和3d条带对齐以及随后的费米能级轨道杂化,可以定性地了解化学趋势。此外,在HM / FM界面的DMI和自旋混合电导之间观察到正相关。我们的结果为设计Futurespintronic设备提供了界面DMI的新见解。

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